Advances in square arrays through self-assembly and directed self-assembly of block copolymers

被引：55
作者：
Hardy, Christopher G. [1 ]
Tang, Chuanbing [1 ]
机构：
[1] Univ S Carolina, Dept Chem & Biochem, Columbia, SC 29208 USA
来源：
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS | 2013年 / 51卷 / 01期
关键词：
block copolymers; lithography; self-assembly; ABC TRIBLOCK COPOLYMERS; THIN-FILMS; MICRODOMAIN ORIENTATION; NANOPOROUS POLYSTYRENE; MICROPHASE SEPARATION; MOLECULAR-WEIGHT; PHASE-BEHAVIOR; MORPHOLOGY; LITHOGRAPHY; BLENDS;
D O I：
10.1002/polb.23174
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self-assembly of block copolymers in bulk and thin films, directed self-assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. (C) 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013
引用
收藏
页码：2 / 15
页数：14
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