Electrophoretic deposition of high quality transparent conductive graphene films on insulating glass substrates

被引:17
|
作者
Ishikawa, R. [1 ,2 ]
Ko, P. J. [1 ,2 ]
Kurokawa, Y. [3 ]
Konagai, M. [3 ,4 ]
Sandhu, A. [1 ,2 ,5 ]
机构
[1] Tokyo Inst Technol, Dept Elect & Elect Engn, Tokyo, Japan
[2] Tokyo Inst Technol, GCOE Prog Evolving Educ & Res Ctr, Tokyo, Japan
[3] Tokyo Inst Technol, Dept Phys Elect, Tokyo, Japan
[4] Tokyo Inst Technol, Photovolta Res Ctr PVREC, Tokyo, Japan
[5] Toyohashi Univ Technol, Elect Inspired Interdisciplinary Res Inst EIIRIS, Toyohashi, Aichi, Japan
来源
ASIA-PACIFIC INTERDISCIPLINARY RESEARCH CONFERENCE 2011 (AP-IRC 2011) | 2012年 / 352卷
关键词
OXIDE-FILMS; LAYERS;
D O I
10.1088/1742-6596/352/1/012003
中图分类号
O59 [应用物理学];
学科分类号
摘要
Graphene is a promising material for transparent conductive films (TCFs) because of its high electrical conductivity and excellent optical transparency over a wide spectral range. We have previously reported on an inexpensive means of producing graphene-based TCFs using chemically derived graphene flakes. However, the deposition of chemically derived graphene can yield poor stacking of graphene flakes, which degrades the electrical conductivity of the resulting films. Here, we describe an alternative approach for producing large areas of TCFs based on electrophoretic deposition of graphene onto glass substrates using charged graphene oxide flakes. This method enabled the deposition of highly stacked graphene films onto insulating glass substrates with potential for TCFs.
引用
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页数:7
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