Temperature-dependent void formation and growth at ion-irradiated nanocrystalline CeO2-Si interfaces

被引:2
|
作者
Perez-Bergquist, Alejandro G. [1 ,2 ]
Zhang, Yanwen [1 ,2 ]
Varga, Tamas [3 ]
Moll, Sandra [4 ]
Namavar, Fereydoon [5 ]
Weber, William J. [1 ,2 ]
机构
[1] Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
[3] Pacific NW Natl Lab, EMSL, Richland, WA 99352 USA
[4] Int AREVA, F-78182 Montigny Le Bretonneux, France
[5] Univ Nebraska Med Ctr, Omaha, NE 68198 USA
关键词
Ion irradiation; Ceria; Transmission electron microscopy; CERIA; OXIDATION; DEFECT; DAMAGE; OXIDE; SIZE;
D O I
10.1016/j.nimb.2014.02.012
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Ceria is a thermally stable ceramic that has numerous applications in the nuclear industry, including use in nuclear fuels and waste forms. Recently, interest has surged in nanostructured ceria due to its increased mechanical properties and electronic conductivity in comparison with bulk ceria and its ability to self-heal in response to energetic ion bombardment. Here, nanocrystalline ceria thin films grown over a silicon substrate are irradiated to fluences of up to similar to 4 x 10(16) ions/cm(2) under different irradiation conditions: with differing ion species (Si+ and Ni+), different ion energies (1.0-1.5 MeV), and at varying temperatures (160-600 K). While the nanocrystalline ceria is found to exhibit exceptional radiation resistance under all tested conditions, severe ion irradiation-induced mixing, void formation, and void growth are observed at the ceria/silicon interface, with the degree of damage proving to be temperature dependent. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:66 / 72
页数:7
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