TWO-STEP RAMAN METHOD FOR INTERFACE THERMAL RESISTANCE AND IN-PLANE THERMAL CONDUCTIVITY CHARACTERIZATION OF GRAPHENE INTERFACE MATERIALS

The negative influence of substrate on in-plane phonon transport in graphene has been revealed by intensive research, whereas the interaction between phonons couplings across graphene/substrate interface and within graphene is still needed to figure out. In this work, we put forward a two-step Raman method to accomplish interface thermal resistance characterization of graphene/SiO2 and in-plane thermal conductivity measurement of supported graphene by SiO2. In order to calculate the interfacial thermal resistance, the temperature difference between graphene and its substrate was probed using Raman thermometry after the graphene film was uniformly electrically heated. Combing the ITR and the temperature response of graphene to laser heating, the thermal conductivity was computed using the fin heat transfer model. Our results shows that the thermal resistance of free graphene/SiO2 is enormous and the thermal conductivity of the supported graphene is significantly suppressed. The phonons scattering and leakage at the interface are mainly responsible for the reduction of thermal conductivity of graphene on substrate. The morphology change of graphene caused by heating mainly determines the huge interfacial thermal resistance and partly contributes to the suppression of thermal conductivity of graphene. This thermal characterization approach simultaneously realizes the non-contact and nondestructive measurement of interfacial thermal resistance and thermal conductivity of graphene interface materials.