Suppression of field crystallization of anodic niobia by oxygen

被引:12
作者
Habazaki, H [1 ]
Ogasawara, T
Konno, H
Shimizu, K
Nagata, S
Asami, K
Takayama, K
Skeldon, P
Thompson, GE
机构
[1] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
[2] Keio Univ, Univ Chem Lab, Yokohama, Kanagawa 2238521, Japan
[3] Tohoku Univ, Mat Res Inst, Sendai, Miyagi 9808577, Japan
[4] Cabot Supermet Co Ltd, Kawasaki, Kanagawa 9693431, Japan
[5] Univ Manchester, Sch Mat, Corros & Protect Ctr, Manchester M60 1QD, Lancs, England
关键词
D O I
10.1149/1.2184909
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Solid-solution Nb-O films containing up to 50 atom % oxygen, prepared by magnetron sputtering, were used to investigate the influence of the oxygen on field crystallization during anodizing at 100 V in 0.1 mol dm(-3) ammonium pentaborate electrolyte at 333 K. The findings reveal that field crystallization is hindered dramatically by addition of 20 atom % oxygen to the substrate, while no crystallization occurs for a Nb-50 atom % O substrate. Prior thermal treatment accelerates field crystallization of niobium, but not the Nb-50 atom % O substrate. The thermal treatment is considered to promote generation of precursor sites for crystal nucleation. However, sufficient oxygen in the substrate may restrict precursor development and/or reduce the compressive stresses in the amorphous anodic niobia that can facilitate crystal growth. (c) 2006 The Electrochemical Society.
引用
收藏
页码:B173 / B177
页数:5
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