Fluorocarbon plasmas for nanotexturing of polymers: A route to water-repellent antireflective surfaces

被引：50
作者：
Di Mundo, Rosa [1 ]
De Benedictis, Vincenzo [1 ]
Palumbo, Fabio [2 ]
d'Agostino, Riccardo [1 ,3 ]
机构：
[1] Univ Bari, Dept Chem, I-70121 Bari, Italy
[2] CNR, Inst Inorgan Methodol & Plasmas IMIP, I-00185 Rome, Italy
[3] Plasma Solut Srl, I-70126 Bari, Italy
来源：
APPLIED SURFACE SCIENCE | 2009年 / 255卷 / 10期
关键词：
CF(4) plasma etching; Polystyrene; Super-hydrophobic; Water contact angle; C(4)F(8) deposition; STICKY;
D O I：
10.1016/j.apsusc.2008.09.020
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this work the roughening of polystyrene by means of radiofrequency plasmas fed with CF(4) has been studied. The effect of the Ar addition to the feed, the input power and the treatment duration has been investigated in terms of etching and fluorination degree. Wettability and reflectance performances of selected textured surfaces, coated with a fluorocarbon film from a C(4)F(8) fed plasma, have been characterized. All the considered surfaces, even those poorly structured, once coated, show slippery superhydrophobicity, while antireflective transparency appears to be limited to precise texturing characteristics. (C) 2008 Elsevier B. V. All rights reserved.
引用
收藏
页码：5461 / 5465
页数：5
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