Crystallographic structure and surface composition of NbNx thin films grown by RF magnetron sputtering

被引：15

作者：

Alfonso, J. E. ^{[1
]}

Buitrago, J. ^{[1
]}

Torres, J. ^{[1
]}

Santos, B. ^{[2
,3
,4
]}

Marco, J. F. ^{[2
]}

机构：

[1] Univ Nacl Colombia, GMAT, Bogota 14490, DC, Colombia

[2] CSIC, Inst Quim Fis Rocasolano, E-28006 Madrid, Spain

[3] Univ Autonoma Madrid, Dept Fis Mat Condensada, Madrid, Spain

[4] Univ Autonoma Madrid, Ctr Microanal Mat, Madrid, Spain

来源：

MICROELECTRONICS JOURNAL | 2008年 / 39卷 / 11期

关键词：

Thin films; Sputtering; XPS;

D O I：

10.1016/j.mejo.2008.01.027

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work we report on the results obtained on NbN(x) thin films grown on both common glass and silicon wafer substrates by RF magnetron sputtering at different substrate temperatures and different target power supplies. The crystalinity, morphology and surface composition of the deposited films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray (C) 2008 Published by Elsevier Ltd.

引用

页码：1327 / 1328

页数：2

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