Polycarbosilane-based films for interlayer dielectric applications

被引：0
|
作者：
Wu, ZZ
Wang, P
Lu, TM
Interrante, LV
机构：
[1] Rensselaer Polytech Inst, Dept Chem, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Phys, Troy, NY 12180 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 229卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
60-PMSE
引用
收藏
页码：U1112 / U1112
页数：1
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