Analysis of temperature effect on a-Si:H thin film transistors

被引：2

作者：

Qiang, L. ^{[1
]}

Yao, R. H. ^{[1
]}

机构：

[1] S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China

来源：

SOLID-STATE ELECTRONICS | 2013年 / 81卷

关键词：

Hydrogenated amorphous silicon; Thin-film transistors; Temperature effect; MEYER-NELDEL RULE; THRESHOLD VOLTAGE MODEL; DISPERSIVE TRANSPORT; SILICON; STABILITY; STATES;

D O I：

10.1016/j.sse.2012.12.002

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An analytical model based on hydrogenated amorphous silicon thin film transistors (a-Si:H TFTs) is proposed to interpret the degradation of output characteristics at different temperatures. The Poisson equation and Gauss theorem are applied to model the temperature effect on the total density of defect states. And the expression of the drain current is derived by exploiting the nonuniform distribution of surface potential. It indicates that the total density of defect states varies linearly with the temperature, whereas the drain current shows an exponential increase with the temperature. In addition, the influence of temperature on the effective mobility under different electric fields is also taken into consideration and results fit well with the experimental data. (C) 2012 Elsevier Ltd. All rights reserved.

引用

页码：13 / 18

页数：6

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