Influence of oxygen precipitation along dislocations on the strength of silicon crystals

被引:59
作者
Yonenaga, I
Sumino, K
机构
[1] Institute for Materials Research, Tohoku University
[2] Nippon Steel Corporation, Futtsu City
关键词
D O I
10.1063/1.362881
中图分类号
O59 [应用物理学];
学科分类号
摘要
The mechanical strength of dislocated crystals of Czochralski-grown silicon as influenced by the precipitation of oxygen impurities on dislocations was investigated. The yield strength increases during the early stage of precipitation of silicon oxide, but decreases remarkably during the later stage of precipitation. The enhancement of the yield strength is brought about by the immobilization of dislocations due to locking: by closely aligned precipitates along the dislocations during the early stage of precipitation. The locking effect diminishes during the late stage when precipitates on dislocations; coalesce with the generation of free portions of dislocations with large separation. (C) 1996 American Institute of Physics.
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页码:734 / 738
页数:5
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