Model for direct-transition gain in a Ge-on-Si laser

被引:15
作者
Chow, Weng W. [1 ]
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
关键词
SEMICONDUCTOR;
D O I
10.1063/1.4714540
中图分类号
O59 [应用物理学];
学科分类号
摘要
This paper describes a laser gain model for the direct, C-point transition in bulk Ge. The model allows calculation of gain and spontaneous-emission spectra for arbitrary strain, as well as doping and injected carrier densities. Many-body effects are included at the level of the screened Hartree-Fock approximation to account for energy renormalization modifications, especially to the impact of n-doping on magnitude and spectral extension of laser gain. Application of the model is illustrated by predicting the net material peak gain versus injected current density under different combinations of tensile strain and n-doping density. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4714540]
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页数:3
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