Electrodeposition and Properties of CuInS2 Thin Films

被引:2
|
作者
Zhou Haifang [1 ]
Chen Xiaohu [2 ]
机构
[1] Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
[2] Coll Fujian Hlth, Fuzhou 350101, Peoples R China
基金
中国国家自然科学基金;
关键词
Electrodeposition; Thin films; Optical properties;
D O I
10.4028/www.scientific.net/AMR.690-693.1659
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The preparation and characterization of CuInS2 thin films on ITO glass substrates prepared by one-step electrodeposition have been reported. Samples were characterized using X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX) and scanning electron microscopy (SEM). The results indicate that CuInS2 is the major phase for the film deposited at -1.0 V, after annealing at 550 degrees C in sulfur atmosphere, and the sample is Cu-rich and p-type semiconductor. Additionally, the energy band gap and carrier concentration for the sample were found to be 1.43 eV and 4.20x10(17) cm(-3), respectively. Furthermore, the maximum photocurrent density of the sample was found to be -1.15 inA/cm(2) under 255 lx illumination, the sample shows the photo-enhancement effect.
引用
收藏
页码:1659 / +
页数:2
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