The analysis of conductive solid samples by rf capacitively coupled plasma at atmospheric pressure

被引：0
|
作者：
Anghel, SD
Frentiu, T
Rusu, AM
Bese, L
Cordos, EA
机构：
[1] UNIV CLUJ,DEPT CHEM,R-3400 CLUJ NAPOCA,ROMANIA
[2] UNIV CLUJ,RES CTR ANALYT INSTRUMENTAT,R-3400 CLUJ NAPOCA,ROMANIA
[3] UNIV CLUJ,DEPT PHYS,R-3400 CLUJ NAPOCA,ROMANIA
[4] SILCOTUB CO,R-4700 ZALAU,ROMANIA
来源：
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1996年 / 355卷 / 3-4期
关键词：
D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
A radiofrequency capacitively coupled plasma (rf CCP) with tip-ring electrode geometry has been used for the analysis of Al, Co, Cr, Cu, Mn, Mo, Ni, and V in low and medium alloyed steel. The sample is used as one of the electrodes of the plasma torch. The influence of plasma power, argon flow rate and distance between the electrodes on the analytical signals has been studied. The limits of detection are in the range of 0.001 to 0.048%. The dynamic range is three orders of magnitude.
引用
收藏
页码：252 / 253
页数：2
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