Ion transport mechanisms in a filtered cathodic vacuum arc (FCVA) system

被引：0
|
作者：
Bilek, MMM [1 ]
Yin, Y [1 ]
McKenzie, DR [1 ]
Milne, WI [1 ]
机构：
[1] UNIV CAMBRIDGE,DEPT ENGN,CAMBRIDGE CB2 1PZ,ENGLAND
来源：
ISDEIV - XVIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, VOLS I AND II | 1996年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：962 / 966
页数：5
相关论文
共 50 条
  • [1] Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
    Bilek, M.M.M.
    Milne, W.I.
    Thin Solid Films, 1996, 290-291 : 299 - 304
  • [2] Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon
    Bilek, MMM
    Milne, WI
    THIN SOLID FILMS, 1996, 290 : 299 - 304
  • [3] Electronic properties and impurity levels in filtered cathodic vacuum arc (FCVA) amorphous silicon
    Univ of Cambridge, Cambridge, United Kingdom
    Thin Solid Films, (79-84):
  • [4] Characterization of filtered cathodic vacuum arc system
    Shi, X.
    Tay, B.K.
    Flynn, D.I.
    Ye, Q.
    Sun, Z.
    Surface and Coatings Technology, 1997, 94-95 (1-3) : 195 - 200
  • [5] Characterization of filtered cathodic vacuum arc system
    Shi, X
    Tay, BK
    Flynn, DI
    Ye, Q
    Sun, Z
    SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3): : 195 - 200
  • [6] Metal ion implantation using a filtered cathodic vacuum arc
    Bilek, MMM
    Evans, P
    Mckenzie, DR
    McCulloch, DG
    Zreiqat, H
    Howlett, CR
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) : 4198 - 4204
  • [7] A study of filter transport mechanisms in filtered cathodic vacuum arcs
    Bilek, MMM
    Yin, YB
    McKenzie, DR
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1996, 24 (03) : 1165 - 1173
  • [8] Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc
    Bilek, MMM
    Chhowalla, M
    Weiler, M
    Milne, WI
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (03) : 1287 - 1291
  • [9] Electronic properties and impurity levels in filtered cathodic vacuum are (FCVA) amorphous silicon
    Bilek, MMM
    Milne, WI
    THIN SOLID FILMS, 1997, 308 : 79 - 84
  • [10] Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique
    Bootkul, D.
    Supsermpol, B.
    Saenphinit, N.
    Aramwit, C.
    Intarasiri, S.
    APPLIED SURFACE SCIENCE, 2014, 310 : 284 - 292
12345