Different crystallization processes of as-deposited amorphous Ge2Sb2Te5 films on nano- and picosecond single laser pulse irradiation

被引:26
作者
Zhang, Ke [1 ]
Li, Simian [2 ]
Liang, Guangfei [1 ]
Huang, Huan [1 ]
Wang, Yang [1 ]
Lai, Tianshu [2 ]
Wu, Yiqun [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab High Power Laser Mat, Shanghai 201800, Peoples R China
[2] Sun Yat Sen Univ, State Key Lab Optoelect Mat & Technol, Dept Phys, Guangzhou 510275, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
Phase-change material; Nanosecond laser pulse; Picosecond laser pulse; Crystallization; Extra-non-equilibrium process; THIN-FILMS; DATA-STORAGE; TEMPERATURE; TRANSITIONS;
D O I
10.1016/j.physb.2012.03.044
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The crystallization dynamics of as-deposited amorphous Ge2Sb2Te5 films induced by nano- and picosecond single laser pulse irradiation is studied using in situ reflectivity measurements. Compared with nanosecond laser pulse, the typical recalescence phenomenon did not appear during the picosecond laser pulse-induced crystallization processes when the pulse fluence gradually increased from crystallization to ablation threshold. The absence of melting and recalescence phenomenon significantly decreased the crystallization time from hundreds to a few tens of nanoseconds. The role of pulse duration time scale on the crystallization process is qualitatively analyzed. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:2447 / 2450
页数:4
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