In situ click-assembling monolayers on copper surface with enhanced corrosion resistance

被引：34

作者：

Yu, Yinzhe ^{[1
]}

Wang, Yizhen ^{[1
]}

Li, Jin ^{[1
]}

Zhang, Daquan ^{[1
]}

Gao, Lixin ^{[1
]}

机构：

[1] Shanghai Univ Elect Power, Sch Environm & Chem Engn, Shanghai Key Lab Mat Protect & Adv Mat Elect Powe, Shanghai 200090, Peoples R China

来源：

CORROSION SCIENCE | 2016年 / 113卷

关键词：

Copper; SAMs; Click-assembling; Modeling studies; Chloride corrosion; MILD-STEEL; ANODIC-DISSOLUTION; INHIBITION; ACID; CHEMISTRY; NACL; 1,2,4-TRIAZOLE; BENZOTRIAZOLE; ADSORPTION; ALUMINUM;

D O I：

10.1016/j.corsci.2016.10.016

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The self-assembled monolayer (SAMs) of 2-(1-tosyl-1H-1,2,3-triazol-4-yl) propan-2-ol (TTP) was in-situ assembled on copper surface via click chemistry reaction between 2, 2-dimethylethynyl carbinol (MBY) and tosyl azide (TA). The electrochemical results indicate that the click-assembled TTP film can strongly suppress the corrosion reaction of copper in 3 wt.% NaCl and its protection efficiency is 93.6%. Polarization curves show that TTP SAMs is an anodic passivation type inhibitor. The adsorption of TTP molecules on Cu2O(0 0 1) surface is in the flat orientation of the nearby triazole ring and O atoms. (C) 2016 Elsevier Ltd. All rights reserved.

引用

页码：133 / 144

页数：12