Design and Architectural Assessment of 3-D Resistive Memory Technologies in FPGAs

被引:35
作者
Gaillardon, Pierre-Emmanuel [1 ]
Sacchetto, Davide [2 ]
Beneventi, Giovanni Betti [3 ]
Ben Jamaa, M. Haykel [3 ]
Perniola, Luca [3 ]
Clermidy, Fabien [3 ]
O'Connor, Ian [4 ,5 ]
De Micheli, Giovanni [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Lab Syst Integrat, CH-1015 Lausanne, Switzerland
[2] Ecole Polytech Fed Lausanne, Lab MicroElect Syst, CH-1015 Lausanne, Switzerland
[3] Commissariat Energie Atom & Energies Alternat, F-38054 Grenoble, France
[4] Ecole Cent Lyon, F-69134 Ecully, France
[5] Ecole Polytech, Montreal, PQ H3T 1J4, Canada
基金
欧洲研究理事会;
关键词
3-D integration; nonvolatile memory; oxide memory; phase-change memory; programmable logic arrays; RRAM;
D O I
10.1109/TNANO.2012.2226747
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Emerging nonvolatile memories (ENVMs) such as phase-change random access memories (PCRAMs) or oxide-based resistive random access memories (OxRRAMs) are promising candidates to replace Flash and Static Random Access Memories in many applications. This paper introduces a novel set of building blocks for field-programmable gate arrays (FPGAs) using ENVMs. We propose an ENVM-based configuration point, a look-up table structure with reduced programming complexity and a high-performance switchbox arrangement. We show that these blocks yield an improvement in area and write time of up to 3x and 33x, respectively, versus a regular Flash implementation. By integrating the designed blocks in an FPGA, we demonstrate an area and delay reduction of up to 28% and 34%, respectively, on a set of benchmark circuits. These reductions are due to the ENVM 3-D integration and to their low on-resistance state value. Finally, we survey many flavors of the technologies and we show that the best results in terms of area and delay are obtained with Pt/TiO2/Pt stack, while the lowest leakage power is achieved by InGeTe stack.
引用
收藏
页码:40 / 50
页数:11
相关论文
共 37 条
  • [1] Ahmed E., 2001, THESIS U TORONTO
  • [2] Highly manufacturable high density phase change memory of 64Mb and beyond
    Ahn, SJ
    Song, YJ
    Jeong, CW
    Shin, JM
    Fai, Y
    Hwang, YN
    Lee, SH
    Ryoo, KC
    Lee, SY
    Park, JH
    Horii, H
    Ha, YH
    Yi, JH
    Kuh, BJ
    Koh, GH
    Jeong, GT
    Jeong, HS
    Kim, K
    Ryu, BI
    [J]. IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, : 907 - 910
  • [3] [Anonymous], 2011, ITRS WINT PUBL C HSI
  • [4] [Anonymous], IEDM, DOI [10.1109/iedm.2009.5424409, DOI 10.1109/IEDM.2009.5424409]
  • [5] [Anonymous], P IEEE INT EL DEV M
  • [6] Carbon-doped GeTe: A promising material for Phase-Change Memories
    Beneventi, G. Betti
    Perniola, L.
    Sousa, V.
    Gourvest, E.
    Maitrejean, S.
    Bastien, J. C.
    Bastard, A.
    Hyot, B.
    Fargeix, A.
    Jahan, C.
    Nodin, J. F.
    Persico, A.
    Fantini, A.
    Blachier, D.
    Toffoli, A.
    Loubriat, S.
    Roule, A.
    Lhostis, S.
    Feldis, H.
    Reimbold, G.
    Billon, T.
    De Salvo, B.
    Larcher, L.
    Pavan, P.
    Bensahel, D.
    Mazoyer, P.
    Annunziata, R.
    Zuliani, P.
    Boulanger, F.
    [J]. SOLID-STATE ELECTRONICS, 2011, 65-66 : 197 - 204
  • [7] Betz V., 1999, Architecture and CAD for Deep-Submicron FPGAs
  • [8] Self-consistent physical modeling of set/reset operations in unipolar resistive-switching memories
    Bocquet, Marc
    Deleruyelle, Damien
    Muller, Christophe
    Portal, Jean-Michel
    [J]. APPLIED PHYSICS LETTERS, 2011, 98 (26)
  • [9] Overview of candidate device technologies for storage-class memory
    Burr, G. W.
    Kurdi, B. N.
    Scott, J. C.
    Lam, C. H.
    Gopalakrishnan, K.
    Shenoy, R. S.
    [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2008, 52 (4-5) : 449 - 464
  • [10] Phase change memory technology
    Burr, Geoffrey W.
    Breitwisch, Matthew J.
    Franceschini, Michele
    Garetto, Davide
    Gopalakrishnan, Kailash
    Jackson, Bryan
    Kurdi, Buelent
    Lam, Chung
    Lastras, Luis A.
    Padilla, Alvaro
    Rajendran, Bipin
    Raoux, Simone
    Shenoy, Rohit S.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (02): : 223 - 262