Elastic properties of van der Waals epitaxy grown bismuth telluride 2D nanosheets

被引:50
作者
Guo, Lingling [1 ,2 ]
Yan, Haoming [1 ,2 ]
Moore, Quentarius [3 ]
Buettner, Michael [2 ]
Song, Jinhui [2 ,4 ]
Li, Lin [2 ,4 ]
Araujo, Paulo T. [2 ,5 ]
Wang, Hung-Ta [1 ,2 ]
机构
[1] Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
[2] Univ Alabama, Ctr Mat Informat Technol MINT Ctr, Tuscaloosa, AL 35487 USA
[3] Jackson State Univ, Dept Chem & Biochem, Jackson, MS 39217 USA
[4] Univ Alabama, Dept Met & Mat Engn, Tuscaloosa, AL 35487 USA
[5] Univ Alabama, Dept Phys & Astron, Tuscaloosa, AL 35487 USA
基金
美国国家科学基金会;
关键词
3-DIMENSIONAL TOPOLOGICAL INSULATOR; MECHANICAL-PROPERTIES; MONOLAYER; CONSTANTS; DYNAMICS; BI2SE3; MODULI; LAYERS; MOS2;
D O I
10.1039/c5nr03282b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Bismuth telluride (Bi2Te3) two-dimensional (2D) nanosheets prepared by van der Waals epitaxy were successfully detached, transferred, and suspended for nano-indentation measurements to be performed on freestanding circular nanosheets. The Young's modulus acquired by fitting linear elastic behaviors of 26 samples (thickness: 5-14 nm) is only 11.7-25.7 GPa, significantly smaller than the bulk in-plane Young's modulus (50-55 GPa). Compliant and robust Bi2Te3 2D nanosheets suggest the feasibility of the elastic strain engineering of topological surface states.
引用
收藏
页码:11915 / 11921
页数:7
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