Electrochemical anodic oxidation of nitrogen doped carbon nanowall films: X-ray photoelectron and Micro-Raman spectroscopy study
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作者:
Achour, A.
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Univ Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, FranceUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Achour, A.
[1
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Vizireanu, S.
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Natl Inst Laser Plasma & Radiat Phys, RO-077125 Bucharest, Romania
Petr Gas Univ Ploiesti, Ploiesti 10068, RomaniaUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Vizireanu, S.
[2
,3
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Dinescu, G.
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Natl Inst Laser Plasma & Radiat Phys, RO-077125 Bucharest, RomaniaUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Dinescu, G.
[2
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Le Brizoual, L.
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Univ Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, FranceUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Le Brizoual, L.
[1
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Djouadi, M. -A.
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Univ Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, FranceUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Djouadi, M. -A.
[1
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Boujtita, M.
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Univ Nantes, CNRS, UNAM, CEISAM, F-44322 Nantes 3, FranceUniv Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Boujtita, M.
[4
]
机构:
[1] Univ Nantes, CNRS, Inst Mat Jean Rouxel, F-44322 Nantes 3, France
Unintentional nitrogen doped carbon nanowall (CNW) films were oxidized through anodic polarization in different applied potential windows, in a mild neutral K2SO4 electrolyte solution. Applied potentials in the range of [0-1], [0-1.5] and [0-2] V vs. SCE were explored. The films were characterized with X-ray photoelectron (XPS) and Micro-Raman spectroscopy, in order to investigate the surface chemistry and structural changes after treatment, respectively. The XPS analysis revealed that this electrochemical treatment leads to an increase of oxygen functional groups, and influences the nitrogen proportion and bonding configuration (such as pyridinic/pyridonic nitrogen) on the film surface at room temperature. In particular, an obvious enhancement of pyrrolic/pyridonic nitrogen doping of CNWs via electrochemical cycling in the range of [0-1.5] and [0-2] V vs. SCE was achieved. Such enhancement happened, because of the oxidation of nitrogen atoms in pyridine as a result of OH ions injection upon electrochemical cycling. Micro-Raman analysis indicates structural quality degradation with increasing the applied potential window. Moreover, the electrochemical capacitance of CNW films was increased after treatment in the range of [0-1] and [0-1.5] and decreased in the range of [0-2] V vs. SCE. The results show that harsh oxidation happened in the range [0-2] V. (C) 2013 Published by Elsevier B. V.
机构:
Northeast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Univ Western Ontario, Dept Earth Sci, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Shi, Weiguang
Liu, Hao
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Chengdu Green Energy & Green Mfg Technol R&D Ctr, Chengdu 610207, Sichuan, Peoples R China
Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Liu, Hao
Dong, Zhaohui
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Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
Univ Western Ontario, Dept Earth Sci, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Dong, Zhaohui
Mi, Zhongying
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Univ Western Ontario, Dept Earth Sci, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Mi, Zhongying
Shieh, Sean R.
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Univ Western Ontario, Dept Earth Sci, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Shieh, Sean R.
Sun, Xueliang
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Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B7, CanadaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
Sun, Xueliang
Liu, Xiaoyang
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机构:
Jilin Univ, Coll Chem, State Key Lab Inorgan Synth & Preparat Chem, Changchun 130023, Jilin, Peoples R ChinaNortheast Petr Univ, Coll Chem & Chem Engn, Daqing 163318, Peoples R China
机构:
Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Koinuma, Michio
Tateishi, Hikaru
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Tateishi, Hikaru
Hatakeyama, Kazuto
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Hatakeyama, Kazuto
Miyamoto, Shinsuke
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Miyamoto, Shinsuke
Ogata, Chikako
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Ogata, Chikako
Funatsu, Asami
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Funatsu, Asami
Taniguchi, Takaaki
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
Taniguchi, Takaaki
Matsumoto, Yasumichi
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Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan
CREST, JST, Chiyoda Ku, Tokyo 1020076, JapanKumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, Kumamoto 8608555, Japan