Growth and structure of CrN nanoislands on Cu(001) studied by scanning tunneling microscopy and X-ray photoemission spectroscopy

被引：1

作者：

Krukowski, P. ^{[1
]}

Iimori, T. ^{[1
]}

Nakatsuji, K. ^{[1
]}

Yamada, M. ^{[1
]}

Komori, F. ^{[1
]}

机构：

[1] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan

来源：

THIN SOLID FILMS | 2013年 / 531卷

关键词：

Chromium nitride; Scanning tunneling microscopy; X-ray photoelectron spectroscopy; Nanoislands; Copper; NITRIDE COATINGS; THIN-FILMS; CHROMIUM; NITROGEN; XPS;

D O I：

10.1016/j.tsf.2012.12.026

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report a method for the fabrication of high structural quality CrN nanoislands on Cu(001). The CrN nanoislands can be fabricated in ultrahigh vacuum conditions by means of Cr atoms deposition on saturated Cu(001)c(2x2)-N surface and subsequent annealing at 500 degrees C. Existence of two types of nanoislands is shown by scanning tunneling microscopy investigations with atomic resolution for different CrN nanoislands formed on surface with 0.35 monolayer Cr coverage. The measured in-plane lattice constant (a=0.39 +/- 0.01 nm) of the CrN nanoislands is 8% larger than the Cu substrate lattice. X-ray photoemission spectroscopy investigations reveal chromium nitride phase transition from CrN to Cr2N associated with changes of Cr concentration. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：251 / 254

页数：4

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