Electrical properties of hydroxyapatite thin films grown by pulsed laser deposition

被引：57
|
作者：
Hontsu, S
Matsumoto, T
Ishii, J
Nakamori, M
Tabata, H
Kawai, T
机构：
[1] KUMANO TECH COLL,DEPT ELECT ENGN,KUMANO,MIE 51943,JAPAN
[2] OSAKA UNIV,INST SCI & IND RES,IBARAKI,OSAKA 567,JAPAN
来源：
THIN SOLID FILMS | 1997年 / 295卷 / 1-2期
关键词：
biomaterials; dielectric properties; electrical properties; laser deposition;
D O I：
10.1016/S0040-6090(96)09146-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The formation of bioceramic hydroxyapatite (HAp) thin films has been accomplished on various substrates, such as Ti, alpha-Al2O3, SiO2// Si(100) and SrTiO3(100) using an ArF pulsed laser deposition. The surface morphology of the HAp films was also examined using an atomic force microscope. Au/HAp/Nb doped SrTiO3(100) structures have been fabricated to measure the electrical properties of the HAp films, and the dielectric constant and breakdown voltage at 25 degrees C are 5.7 (at 1 MHz) and 10(4) V Cm-1, respectively. From our results, it is suggested that the HAp films are useful not only as a biocompatible coating material for implantation but also for insulating and dielectric materials used in electric circuits and bio-electronic devices. (C) 1997 Elsevier Science S.A.
引用
收藏
页码：214 / 217
页数：4
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