Micropatterning of inorganic-organic hybrid thick films from vinyltriethoxysilane

被引:10
作者
Tadanaga, K
Sueki, T
Matsuda, A
Minami, T
Tatsumisago, M
机构
[1] Osaka Prefecture Univ, Grad Sch Engn, Dept Appl Chem, Sakai, Osaka 5998531, Japan
[2] Toyohashi Univ Technol, Dept Mat Sci, Toyohashi, Aichi 4418580, Japan
关键词
inorganic-organic hybrids; micropatterning; UV irradiation; vinyltriethoxysilane;
D O I
10.2109/jcersj.114.125
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Inorganic-organic hybrid films with a maximum thickness of about 40 mu m were prepared from vinyltriethoxysilane (VTES) through a sol-gel process. UV light from a high-pressure mercury lamp was irradiated through a photomask on the hybrid films from VTES. IR and Si-29 NMR spectra of the coating films showed that C=C bonds in VTES were polymerized by UV irradiation. Micropatterns with a maximum height of about 40 mu m were formed by the etching of unirradiated area of the films.
引用
收藏
页码:125 / 127
页数:3
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