Synthesis of a-C coatings by HPPMS using Ar, Ne and He as process gases

被引:20
作者
Bobzin, K. [1 ]
Broegelmann, T. [1 ]
Kalscheuer, C. [1 ]
Engels, M. [1 ]
机构
[1] Rhein Westfal TH Aachen, Surface Engn Inst, Kackertstr 15, D-52072 Aachen, Germany
关键词
DLC; a-C; HPPMS; HiPIMS; PVD; Nanoindentation; Raman spectroscopy; CARBON-FILMS; MAGNETRON; MICROSTRUCTURE; IONIZATION; BEHAVIOR; LOAD;
D O I
10.1016/j.surfcoat.2016.07.099
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Diamond-like carbon (DLC) coatings are used in numerous tribological applications, for example components of the automotive powertrain. The universal hardness HU of these coatings correlates with the sp(3)/sp(2) bond ratio between the carbon atoms. Research on the synthesis of these coatings is upon physical vapor deposition (PVD) processes, especially the high power pulsed/impulse magnetron sputtering (HPPMS/HiPIMS). Synthesizing DLC coatings with a high sp(3)/sp(2) ratio requires high energetic carbon ions, whose generation strongly depends on the HPPMS process parameters. Plasma diagnostics have shown that the energy of the carbon ions in the plasma strongly depends on the process gas mixture, the process gas pressure and the bias voltage. An increased fraction of high energetic carbon ions in the HPPMS plasma has been reported for process gases with a higher ionization energy as well as for higher bias voltage and lower process gas pressure. Therefore, the aim of this work is to investigate the correlation of the plasma parameters with the properties of DLC coatings. Ar, Ne and He were used as process gases. Process gas pressure and bias voltage were varied between p = 0.52.5 Pa and U-B = -300-0 V, respectively. The coatings were deposited in a high volume semi-industrial coating unit. It was observed that the coating properties strongly correlate with the results from the plasma diagnostics. Dependencies of the sp(3)/sp(2) ratios and hardness on the ionization energy of the process gas, the process gas pressure and bias voltages could be found. Hardness values up to HU = 45 GPa have been achieved. In conclusion it can be claimed that synthesis of DLC coatings with high hardness is possible by HPPMS processes using process gas mixtures of Ar, Ne and He. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:80 / 89
页数:10
相关论文
共 30 条
[1]   A strategy for increased carbon ionization in magnetron sputtering discharges [J].
Aijaz, Asim ;
Sarakinos, Kostas ;
Lundin, Daniel ;
Brenning, Nils ;
Helmersson, Ulf .
DIAMOND AND RELATED MATERIALS, 2012, 23 :1-4
[2]   High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target [J].
Alami, J. ;
Eklund, P. ;
Emmerlich, J. ;
Wilhelmsson, O. ;
Jansson, U. ;
Hogberg, H. ;
Hultman, L. ;
Helmersson, U. .
THIN SOLID FILMS, 2006, 515 (04) :1731-1736
[3]  
Anders A., 2010, Cathodic Arcs: From Fractal Spots to Energetic Condensation
[4]   (Cr1-xAlx)N: A comparison of direct current, middle frequency pulsed and high power pulsed magnetron sputtering for injection molding components [J].
Bagcivan, N. ;
Bobzin, K. ;
Theiss, S. .
THIN SOLID FILMS, 2013, 528 :180-186
[5]   Effect of substrate temperature and heat treatment on the microstructure of diamondlike carbon films [J].
Bhargava, S ;
Bist, HD ;
Narlikar, AV ;
Samanta, SB ;
Narayan, J ;
Tripathi, HB .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (04) :1917-1925
[6]  
Bobzin K, 2016, VAK FORSCH PRAX, V28, P28, DOI [10.1002/vipr.201600632, 10.1002/vipr.201500591]
[7]   Behavior of DLC coated low-alloy steel under tribological and corrosive load: Effect of top layer and interlayer variation [J].
Bobzin, Kirsten ;
Bagcivan, Nazlim ;
Theiss, Sebastian ;
Weiss, Raphael ;
Depner, Udo ;
Trossmann, Torsten ;
Ellermeier, Joerg ;
Oechsner, Matthias .
SURFACE & COATINGS TECHNOLOGY, 2013, 215 :110-118
[8]   Ionization of sputtered metals in high power pulsed magnetron sputtering [J].
Bohlmark, J ;
Alami, J ;
Christou, C ;
Ehiasarian, AP ;
Helmersson, U .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (01) :18-22
[9]   Ionization of sputtered material in a planar magnetron discharge [J].
Christou, C ;
Barber, ZH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (06) :2897-2907
[10]   Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique [J].
Ehiasarian, AP ;
Hovsepian, PE ;
Hultman, L ;
Helmersson, U .
THIN SOLID FILMS, 2004, 457 (02) :270-277