High resolution imaging and lithography with hard x rays using parabolic compound refractive lenses

被引:36
作者
Schroer, CG [1 ]
Benner, B
Günzler, TF
Kuhlmann, M
Zimprich, C
Lengeler, B
Rau, C
Weitkamp, T
Snigirev, A
Snigireva, I
Appenzeller, J
机构
[1] Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany
[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[3] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1063/1.1445827
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Parabolic compound refractive lenses are high quality optical components for hard x rays. They are particularly suited for full field imaging, with applications in microscopy and x-ray lithography. Taking advantage of the large penetration depth of hard x rays, the interior of opaque samples can be imaged with submicrometer resolution. To obtain the three-dimensional structure of a sample, microscopy is combined with tomographic techniques. In a first hard x-ray lithography experiment, parabolic compound refractive lenses have been used to project the reduced image of a lithography mask onto a resist. Future developments are discussed. (C) 2002 American Institute of Physics.
引用
收藏
页码:1640 / 1642
页数:3
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