Electronic structure of intrinsic defects in crystalline germanium telluride

被引:202
作者
Edwards, AH
Pineda, AC
Schultz, PA
Martin, MG
Thompson, AP
Hjalmarson, HP
Umrigar, CJ
机构
[1] USAF, Space Vehicles Directorate, Kirtland AFB, NM 87117 USA
[2] Sandia Natl Labs, Multiscale Computat Mat Methods, Albuquerque, NM 87185 USA
[3] Cornell Univ, Cornell Theory Ctr, Ithaca, NY 14853 USA
来源
PHYSICAL REVIEW B | 2006年 / 73卷 / 04期
关键词
D O I
10.1103/PhysRevB.73.045210
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Germanium telluride undergoes rapid transition between polycrystalline and amorphous states under either optical or electrical excitation. While the crystalline phases are predicted to be semiconductors, polycrystalline germanium telluride always exhibits p-type metallic conductivity. We present a study of the electronic structure and formation energies of the vacancy and antisite defects in both known crystalline phases. We show that these intrinsic defects determine the nature of free-carrier transport in crystalline germanium telluride. Germanium vacancies require roughly one-third the energy of the other three defects to form, making this by far the most favorable intrinsic defect. While the tellurium antisite and vacancy induce gap states, the germanium counterparts do not. A simple counting argument, reinforced by integration over the density of states, predicts that the germanium vacancy leads to empty states at the top of the valence band, thus giving a complete explanation of the observed p-type metallic conduction.
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页数:13
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