Performance Improvement of Organic Thin Film Transistors with Self-Assembled Monolayer Formed by ALD

被引：0

作者：

Kim, Hyunsuck ^{[1
]}

Park, Jaehoon ^{[1
]}

Bong, Kang Wook ^{[1
]}

Kang, Jong Mook ^{[1
]}

Kim, Hye Min ^{[1
]}

Choi, Jong Sun ^{[1
]}

机构：

[1] Hongik Univ, Dept Elect Informat & Control Engn, Seoul 121791, South Korea

来源：

IMID/IDMC 2006: THE 6TH INTERNATIONAL MEETING ON INFORMATION DISPLAY/THE 5TH INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE, DIGEST OF TECHNICAL PAPERS | 2006年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this study, the effects of SAMs on the performance of OTFTs have been investigated. ALD technique was applied for the deposition of SAMs, which is an ultra-thin film deposition technique based on sequences of self-limiting surface reactions enabling thickness control on atomic scale. According to our investigation results, it is observed that the surface properties of the gate insulator was changed by SAMs, which allow pentacene molecules to be deposited in the upright direction on the gate insulator and hence the performance of OTFTs could be improved. These results will be discussed

引用

页码：1166 / 1169

页数：4

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