A parameterization of the chemistry-normality dependence of bulk etch rate in a CR-39 detector

被引：8
作者：
Al-Jubbori, Mushtaq Abed [1 ]
机构：
[1] Univ Mosul, Coll Educ Pure Sci, Dept Phys, Mosul 41001, Iraq
来源：
APPLIED RADIATION AND ISOTOPES | 2016年 / 118卷
关键词：
Normality; Bulk etch rate; Length-Diameter (L-D) method; Modeling; CR-39; NUCLEAR TRACK DETECTORS; ALPHA-PARTICLES; TEMPERATURE; PROFILES; DEPTH; MODEL;
D O I：
10.1016/j.apradiso.2016.09.022
中图分类号：
O61 [无机化学];
学科分类号：
070301 ; 081704 ;
摘要：
An empirical relationship describing the bulk etch rate is formulated. The equation involves two free fitting parameters, which reproduce the bulk etch rate for CR-39 by alpha particles at different normalities of the etching solution. The values of the fitting parameters were obtained from the experimental data. This relationship is used to predict the bulk etch rate at different normalities.
引用
收藏
页码：228 / 231
页数：4
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