The degradation of aniline solution using the dielectric barrier discharge (DBD) plasma was studied in this paper. The results indicated that the initial concentration of aniline, applied voltage and initial pH value affected the removal efficiency of aniline significantly. After 12 min with DBD plasma treatment, 90.2% removal efficiency was achieved at aniline concentration of 100 mg L-1 with an applied voltage of 3.0 kV and pH 8.43. The removal efficiency decreased with the presence of radical scavengers, indicating that hydroxyl radical plays a key role in the degradation process. The removal efficiency increased obviously when Fe2+ was added. Additionally, the intermediate products generated in the degradation process of aniline were analyzed by some analytical techniques, including total organic carbon analysis, ultraviolet-visible spectroscopy, Fourier Transform Infrared spectroscopy, Gas Chromatography-Mass Spectrometer, etc. The results showed that the degradation of aniline was mainly due to the strong oxidizing capacity of hydroxyl radical produced by the DBD plasma system. Based on the intermediate products identified in the study, the possible degradation mechanism and pathways were proposed. (C) 2019 Elsevier Ltd. All rights reserved.
机构:
East China Univ Sci & Technol, Resources & Environm Engn, Shanghai 200237, Peoples R ChinaEast China Univ Sci & Technol, Resources & Environm Engn, Shanghai 200237, Peoples R China
Pan, Xiao-yi
Qiao, Xiu-chen
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East China Univ Sci & Technol, Resources & Environm Engn, Shanghai 200237, Peoples R ChinaEast China Univ Sci & Technol, Resources & Environm Engn, Shanghai 200237, Peoples R China
机构:
Univ Tehran Med Sci, Sch Publ Hlth, Dept Environm Hlth Engn, Tehran, Iran
Univ Tehran Med Sci, Inst Environm Res, Ctr Water Qual Res, Tehran, IranShahid Beheshti Univ, Dept Phys, Tehran 1983963113, Iran
Yaghmaeian, Kamyar
Shokri, Babak
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Shahid Beheshti Univ, Dept Phys, Tehran 1983963113, Iran
Shahid Beheshti Univ, Laser & Plasma Res Inst, Tehran 1983963113, IranShahid Beheshti Univ, Dept Phys, Tehran 1983963113, Iran