Trapping and processing of dust particles in a low-pressure discharge

被引:6
作者
Stoffels, E [1 ]
Stoffels, WW [1 ]
Swinkels, GHPM [1 ]
Kroesen, GMW [1 ]
机构
[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands
来源
FRONTIERS IN DUSTY PLASMAS | 2000年
关键词
D O I
10.1016/B978-044450398-5/50025-7
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Formation, behaviour and modification of dust particles in a low-pressure plasma are discussed. Coulomb interactions of negatively charged particles together with other forces in the plasma result in efficient trapping. A single particle can be kept motionless in the plasma, and fully controlled by the experimentalist. We are able to accurately determine the particle properties by angle-resolved Mie scattering, and modify them by etching or deposition in the plasma. This research is related to the industrial demand for particles with specially tailored properties. We show that a low-pressure discharge is well suitable for production or surface modification of special dust particles.
引用
收藏
页码:177 / 184
页数:8
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