Investigation of the dissociative adsorption for cyclopropane on the copper surface by density functional theory and quantum. chemical molecular dynamics method

被引:3
作者
Wang, Xiaojing [1 ]
Wang, Yajun
Lv, Chen
Kubo, Momoji
Miyamoto, Akira
机构
[1] Inner Mongolia Univ, Coll Chem & Chem Engn, Dept Chem, Hohhot, Peoples R China
[2] Tohoku Univ, Grad Sch Engn, Dept Appl Chem, Sendai, Miyagi 9808579, Japan
[3] Tohoku Univ, New Ind Creat Hatchery Ctr, Sendai, Miyagi 9808579, Japan
关键词
cyclopropane; copper; dissociative adsorption; density functional theory; quantum chemical molecular dynamics method;
D O I
10.1016/j.susc.2006.10.043
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The dissociative adsorption of cyclopropane on the copper surface was studied using quantum chemical molecular dynamics method with "Colors-Excite" code and density functional theory by Amsterdam Density Functional program (ADF2000). The excited state of cyclopropane was used as adsorbate to simulate the dissociated adsorption under an irradiation energy of ca. 10 eV. One of the C-C bonds in cyclopropane was broken and the two new bonds between cyclopropane and copper surface were formed. The electrons transferred from the copper atoms to cyclopropane with a value of about 0.2e. The shorter distances between the carbons and surface copper atoms showed the existence of strong interaction. Consistently, the results indicated metallacyclopentane was the most possible intermediate species in dissociative adsorption by ADF2000 and "Colors-Excite" method. (c) 2006 Elsevier B.V. All rights reserved.
引用
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页码:679 / 685
页数:7
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