Comprehensive model of electron energy deposition

We present our effort in developing a complete model of electron energy transfer from fast electrons (0.1-100 keV) to the photoresist. Our model is based on the direct Monte Carlo method, instead of using continuous slowing down approximation, model and a stopping power curve. We separate the interaction events into four types: Elastic, ionization, excitation, and plasmon. Our results show that: First, secondary electrons are major mechanism of energy distribution; and second, plasmons are very efficient "friction" mechanism but do not create molecular changes; and finally, excitations lead to molecular changes. (C) 2002 American Vacuum Society.