Investigation of electrical characteristics of Ag/ZnO/Si sandwich structure

被引:12
作者
Gullu, H. H. [1 ]
Surucu, O. Bayrakli [2 ,3 ]
Terlemezoglu, M. [3 ,4 ,5 ]
Yildiz, D. E. [6 ]
Parlak, M. [3 ,4 ]
机构
[1] Atilim Univ, Dept Elect & Elect Engn, TR-06836 Ankara, Turkey
[2] Kirsehir Ahi Evran Univ, Dept Phys, TR-40100 Kirsehir, Turkey
[3] Middle East Tech Univ, Ctr Solar Energy Res & Applicat GUNAM, TR-06800 Ankara, Turkey
[4] Middle East Tech Univ, Dept Phys, TR-06800 Ankara, Turkey
[5] Tekirdag Namik Kemal Univ, Dept Phys, TR-59030 Tekirdag, Turkey
[6] Hitit Univ, Dept Phys, TR-19030 Corum, Turkey
关键词
CURRENT TRANSPORT MECHANISMS; INTERFACE-STATE DENSITY; SERIES RESISTANCE; SCHOTTKY CONTACTS; I-V; HETEROJUNCTION DIODE; FREQUENCY; FABRICATION; BARRIERS; LAYER;
D O I
10.1007/s10854-019-01913-w
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, temperature-dependent current-voltage (I-V), frequency-dependent capacitance-voltage (C-V) and conductance-voltage (G/omega-V) measurements are carried out for the electrical characterization of a zinc oxide (ZnO) thin film-based diode. The sandwich structure in the form of Ag/ZnO/Si/Al is investigated at temperatures between 220 and 360 K and in the frequency region of 1 kHz-1 MHz. ZnO thin film layer is deposited on a p-Si wafer substrate as a transparent conductive oxide layer by taking into consideration possible electronic applications with intrinsic attractive material properties. At each temperature step, the I-V curves showed about two orders of magnitude rectifying behavior and, according to the Schottky diode relation, the saturation current, zero-bias barrier height and ideality factor were extracted as a function of the temperature. In the case of non-ideal diode characteristics due to the inhomogeneties in the diode as observed from the characteristics of the calculated parameters, effective barrier height values are evaluated. In addition, based on the existence of the interface layer, density of interface states in the band gap region and parasitic resistances were determined by the capacitance measurements.
引用
收藏
页码:15371 / 15378
页数:8
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