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Self-assembled ferrofluid lithography: patterning micro and nanostructures by controlling magnetic nanoparticles
被引:29
|作者:
Chang, Chih-Hao
[1
,2
]
Tan, Chee-Wee
[1
,3
]
Miao, Jianmin
[3
]
Barbastathis, George
[1
,2
]
机构:
[1] Singapore MIT Alliance Res & Technol SMART Ctr, Singapore, Singapore
[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
[3] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore, Singapore
基金:
新加坡国家研究基金会;
关键词:
NANOSPHERE LITHOGRAPHY;
ORDERED STRUCTURES;
BLOCK-COPOLYMERS;
FILMS;
D O I:
10.1088/0957-4484/20/49/495301
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.
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页数:4
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