Self-assembled ferrofluid lithography: patterning micro and nanostructures by controlling magnetic nanoparticles

被引:29
|
作者
Chang, Chih-Hao [1 ,2 ]
Tan, Chee-Wee [1 ,3 ]
Miao, Jianmin [3 ]
Barbastathis, George [1 ,2 ]
机构
[1] Singapore MIT Alliance Res & Technol SMART Ctr, Singapore, Singapore
[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
[3] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore, Singapore
基金
新加坡国家研究基金会;
关键词
NANOSPHERE LITHOGRAPHY; ORDERED STRUCTURES; BLOCK-COPOLYMERS; FILMS;
D O I
10.1088/0957-4484/20/49/495301
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.
引用
收藏
页数:4
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