Self-assembled ferrofluid lithography: patterning micro and nanostructures by controlling magnetic nanoparticles

被引：30

作者：

Chang, Chih-Hao ^{[1
,2
]}

Tan, Chee-Wee ^{[1
,3
]}

Miao, Jianmin ^{[3
]}

Barbastathis, George ^{[1
,2
]}

机构：

[1] Singapore MIT Alliance Res & Technol SMART Ctr, Singapore, Singapore

[2] MIT, Dept Mech Engn, Cambridge, MA 02139 USA

[3] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore, Singapore

来源：

NANOTECHNOLOGY | 2009年 / 20卷 / 49期

基金：

新加坡国家研究基金会;

关键词：

NANOSPHERE LITHOGRAPHY; ORDERED STRUCTURES; BLOCK-COPOLYMERS; FILMS;

D O I：

10.1088/0957-4484/20/49/495301

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have developed an alternative self-assembly process to pattern different geometries with user-defined tunability across the micro and nanoscale. In this approach, field-induced assembly of colloidal magnetic nanoparticles within a microfluidic channel is used as a tunable mask for near-field lithography. We have fabricated dot arrays with controllable spacing and micro-ring patterns with 250 nm feature sizes. The proposed process is versatile, cost-effective, and scalable, presenting itself as a promising nanomanufacturing tool.

引用

页数：4

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