Design of electrostatic microcolumn for nanoscale photoemission source in massively parallel electron-beam lithography

被引：1

作者：

Wen, Ye ^{[1
]}

Du, Zhidong ^{[1
]}

Pan, Liang ^{[1
]}

机构：

[1] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA

来源：

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2015年 / 14卷 / 04期

基金：

美国国家科学基金会;

关键词：

electron-beam lithography; multiple beam direct write; electron optics; microcolumn; maskless lithography; COLUMN; SYSTEM; GENERATION; LENSES; PROBE;

D O I：

10.1117/1.JMM.14.4.043508

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)

引用

页数：7

共 31 条

[1] Semiconductor on glass photocathodes for high throughput maskless electron beam lithography [J].