Structure dependent dielectric response of spray coated nanostructured zirconia thin films

被引:2
作者
Mohan, Sreedevi R. [1 ]
Maheswari, A. Uma [1 ]
Sivakumar, M. [1 ]
机构
[1] Amrita Vishwa Vidyapeetham, Dept Sci, Amrita Sch Engn, Coimbatore, Tamil Nadu, India
关键词
ZrO2; nanoparticles; tetragonal zirconia; dielectric properties; EPR analysis; VAPOR-DEPOSITION; PHASE; CONSTANT; NANOPARTICLES; SURFACTANT;
D O I
10.1088/2053-1591/ab0a4c
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work the structural dependent dielectric property of ZrO2 nanoparticles and films prepared using these nanoparticles is studied. The tetragonal and monoclinic dominant zirconia nanoparticles were obtained through thermal treatment of PVP/CTAB capped hydrous amorphous zirconia (HAZ) at 500 degrees C. The grain (R-g) and grain boundary (R-gb) resistances of both types of nanoparticles along with films are estimated by fitting the respective complex impedance (Nyquist) plots with an equivalent electrical circuit. The nanostructured tetragonal dominant zirconia films are highly conductive as compared to monoclinic films due to large amount of Zr3+ ions present at tetragonal sites. Consequently the film exhibits a high dielectric constant at lower frequency range due to Maxwell-Wagner polarization. Moreover the EPR signals observed at 1.946 (g(parallel to)) and 1.967 (g(perpendicular to)) reveals the presence of greater Zr3+ ions tetragonal films. The R-gb of monoclinic dominant film is increased by an order of 10(3) and consequently results in significant reduction of dielectric constant. Further the shift of loss tangent peak to higher frequency side of tetragonal dominant films endorses the higher mobility of charge carriers as that of monoclinic films. The enhancement of dielectric properties shows the potential application of tetragonal dominant ZrO2 films for future electronic devices.
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页数:9
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共 28 条
  • [1] Yttria-doped zirconia thin films deposited by atomic layer deposition ALD:: a structural, morphological and electrical characterisation
    Bernay, C
    Ringuedé, A
    Colomban, P
    Lincot, D
    Cassir, M
    [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2003, 64 (9-10) : 1761 - 1770
  • [2] Phase-controlled synthesis of ZrO2 nanoparticles for highly transparent dielectric thin films
    Cheema, Tarik Ali
    Garnweitner, Georg
    [J]. CRYSTENGCOMM, 2014, 16 (16): : 3366 - 3375
  • [3] Chemical vapor deposition of electrolyte thin films based on yttria-stabilized zirconia
    Gelfond, N. V.
    Bobrenok, O. F.
    Predtechensky, M. R.
    Morozova, N. B.
    Zherikova, K. V.
    Igumenov, I. K.
    [J]. INORGANIC MATERIALS, 2009, 45 (06) : 659 - 665
  • [4] Hafnium zirconate gate dielectric for advanced gate stack applications
    Hegde, R. I.
    Triyoso, D. H.
    Samavedam, S. B.
    White, B. E., Jr.
    [J]. JOURNAL OF APPLIED PHYSICS, 2007, 101 (07)
  • [5] Determination of effective capacitance and film thickness from constant-phase-element parameters
    Hirschorn, Bryan
    Orazem, Mark E.
    Tribollet, Bernard
    Vivier, Vincent
    Frateur, Isabelle
    Musiani, Marco
    [J]. ELECTROCHIMICA ACTA, 2010, 55 (21) : 6218 - 6227
  • [6] Electronic band structure of zirconia and hafnia polymorphs from the GW perspective
    Jiang, Hong
    Gomez-Abal, Ricardo I.
    Rinke, Patrick
    Scheffler, Matthias
    [J]. PHYSICAL REVIEW B, 2010, 81 (08)
  • [7] ON THE DISPERSION OF RESISTIVITY AND DIELECTRIC CONSTANT OF SOME SEMICONDUCTORS AT AUDIOFREQUENCIES
    KOOPS, CG
    [J]. PHYSICAL REVIEW, 1951, 83 (01): : 121 - 124
  • [8] Study of active species of Cu-K/ZrO2 catalysts involved in the oxidation of soot
    Laversin, H.
    Courcot, D.
    Zhilinskaya, E. A.
    Cousin, R.
    Aboukais, A.
    [J]. JOURNAL OF CATALYSIS, 2006, 241 (02) : 456 - 464
  • [9] Effect of surfactant and mineralizer on the dielectric properties of zirconia nanocrsytals
    Maheswari, A. Uma
    Mohan, Sreedevi R.
    Sivakumar, M.
    [J]. APPLIED SURFACE SCIENCE, 2018, 427 : 1174 - 1182
  • [10] Phase tuning of zirconia nanocrystals by varying the surfactant and alkaline mineralizer
    Maheswari, A. Uma
    Mohan, Sreedevi R.
    Kumar, S. Sarayana
    Sivakumar, M.
    [J]. CERAMICS INTERNATIONAL, 2014, 40 (05) : 6561 - 6568