Low-loss integrated photonics for the blue and ultraviolet regime

被引:82
|
作者
West, Gavin N. [1 ]
Loh, William [2 ]
Kharas, Dave [2 ]
Sorace-Agaskar, Cheryl [2 ]
Mehta, Karan K. [1 ]
Sage, Jeremy [2 ]
Chiaverini, John [2 ]
Ram, Rajeev J. [1 ]
机构
[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[2] MIT, Lincoln Lab, Lexington, MA 02421 USA
基金
美国国家科学基金会;
关键词
ATOMIC LAYER DEPOSITION; WAVE-GUIDES; TEMPERATURE-DEPENDENCE; AL2O3; ALUMINUM; BEHAVIOR; PLATFORM; PROBES; SI3N4; FILMS;
D O I
10.1063/1.5052502
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with intrinsic quality factors exceeding 470 000 are demonstrated at 405 nm, and the thermo-optic coefficient of ALD aluminum oxide is estimated to be 2.75 x 10(-5) (RIU/degrees C). Absorption loss is sufficiently low to allow on-resonance operation with intra-cavity powers up to at least 12.5 mW, limited by available laser power. Experimental and simulated data indicate that the propagation loss is dominated by sidewall roughness, suggesting that lower loss in the blue and UV is achievable. (C) 2019 Author(s).
引用
收藏
页数:7
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