Domain relaxation dynamics in epitaxial BiFeO3 films: Role of surface charges

被引:27
作者
Chen, Yi-Chun [1 ]
Ko, Cheng-Hung [1 ]
Huang, Yen-Chin [1 ]
Yang, Jan-Chi [2 ]
Chu, Ying-Hao [2 ]
机构
[1] Natl Cheng Kung Univ, Dept Phys, Tainan 70101, Taiwan
[2] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30010, Taiwan
关键词
THIN-FILMS;
D O I
10.1063/1.4746077
中图分类号
O59 [应用物理学];
学科分类号
摘要
The thermodynamic parameters of domain relaxation process in the absence of external electric fields are related to the intrinsic electrostatic and stress/strain conditions inside the materials, such as the states at surface, states at interface with the electrode, and the atomic defects in the bulk. In order to perform systematical studies of these intrinsic effects, we investigated domain relaxation in a monodomain environment, which was obtained in strained epitaxial BiFeO3 (BFO)(111) films. Without as-grown domain walls and grain boundaries, the epitaxial BFO (111) film provided an ideal system for the dynamic observation of 180-degree domain wall motion. Nano-domains were initially created by writing voltage pulses under the tip of a scanning force microscope and then relaxed through time. The downward polarized domains exhibited much better retention behaviors than the upward domains. A two-step backswitching process was observed, and the behaviors varied with the initial domain sizes. Surface potential measurement showed the dissipation of surface screen charges with time, which was strongly coupled with the 1st step relaxation. The asymmetry behaviors for upward and downward backswitchings, and the two-stage relaxation processes can be explained by the mobile vacancies and the redistribution of surface charges. This study provides the basic understanding of the role of surface charges during the ferroelectric domain relaxation. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4746077]
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页数:6
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