共 59 条
Exploring the possibility of semiconducting BaSi2 for thin-film solar cell applications
被引:102
作者:

Suemasu, Takashi
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机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
CREST, Japan Sci & Technol Agcy, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
机构:
[1] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[2] CREST, Japan Sci & Technol Agcy, Chiyoda Ku, Tokyo 1020075, Japan
基金:
日本科学技术振兴机构;
关键词:
BEAM-INDUCED CURRENT;
EPITAXIAL-FILMS;
MICROCRYSTALLINE SILICON;
GRAIN-BOUNDARIES;
SI(111);
FABRICATION;
MECHANISM;
PRESSURE;
GROWTH;
D O I:
10.7567/JJAP.54.07JA01
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Semiconducting BaSi2 has attractive features for thin-film solar cell applications because both a large absorption coefficient and a long minority-carrier diffusion length can be utilized. In this article, we explore the possibility of semiconducting BaSi2 films for thin-film solar cell applications. Recent experimental results on the optical absorption coefficient, minority-carrier diffusion length, and minority-carrier lifetime in undoped n-BaSi2 films are presented. After that, the photoresponse spectra are calculated for a BaSi2 p(+)n abrupt homojunction diode based on the one-dimensional carrier continuity equation using previously reported experimental values. The individual contributions of the three layers, that is, the neutral p(+)-type layer, the depletion region, and the neutral n-type layer, to the total photoresponse are discussed. The photoresponse depends on parameters such as layer thickness, minority-carrier diffusion length, and surface recombination velocity. We further estimate the photocurrent density and the open-circuit voltage under AM 1.5 illumination. (C) 2015 The Japan Society of Applied Physics
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共 59 条
[1]
Evaluation of minority carrier diffusion length of undoped n-BaSi2 epitaxial thin films on Si(001) substrates by electron-beam-induced-current technique
[J].
Baba, Masakazu
;
Watanabe, Kentaro
;
Hara, Kosuke O.
;
Toko, Kaoru
;
Sekiguchi, Takashi
;
Usami, Noritaka
;
Suemasu, Takashi
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
2014, 53 (07)

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Watanabe, Kentaro
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Hara, Kosuke O.
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
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机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Sekiguchi, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Usami, Noritaka
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[2]
Evaluation of potential variations around grain boundaries in BaSi2 epitaxial films by Kelvin probe force microscopy
[J].
Baba, Masakazu
;
Tsurekawa, Sadahiro
;
Watanabe, Kentaro
;
Du, W.
;
Toko, Kaoru
;
Hara, Kosuke O.
;
Usami, Noritaka
;
Sekiguchi, Takashi
;
Suemasu, Takashi
.
APPLIED PHYSICS LETTERS,
2013, 103 (14)

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Tsurekawa, Sadahiro
论文数: 0 引用数: 0
h-index: 0
机构:
Kumamoto Univ, Grad Sch Sci & Technol, Kumamoto 8608555, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Watanabe, Kentaro
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Du, W.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Hara, Kosuke O.
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Usami, Noritaka
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Sekiguchi, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[3]
Hard x-ray photoelectron spectroscopy study on valence band structure of semiconducting BaSi2
[J].
Baba, Masakazu
;
Ito, Keita
;
Du, Weijie
;
Sanai, Tatsunori
;
Okamoto, Kazuaki
;
Toko, Kaoru
;
Ueda, Shigenori
;
Imai, Yoji
;
Kimura, Akio
;
Suemasu, Takashi
.
JOURNAL OF APPLIED PHYSICS,
2013, 114 (12)

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Ito, Keita
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Du, Weijie
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Sanai, Tatsunori
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Okamoto, Kazuaki
论文数: 0 引用数: 0
h-index: 0
机构:
Hiroshima Univ, Grad Sch Sci, Hiroshima 7398526, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Ueda, Shigenori
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Synchrotron Xray Stn SPring 8, Mikazuki, Hyogo 6795148, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Imai, Yoji
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, AIST, Tsukuba, Ibaraki 3058565, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Kimura, Akio
论文数: 0 引用数: 0
h-index: 0
机构:
Hiroshima Univ, Grad Sch Sci, Hiroshima 7398526, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[4]
Molecular Beam Epitaxy of BaSi2 Films with Grain Size over 4 μm on Si(111)
[J].
Baba, Masakazu
;
Nakamura, Kotaro
;
Du, Weijie
;
Khan, M. Ajmal
;
Koike, Shintaro
;
Toko, Kaoru
;
Usami, Noritaka
;
Saito, Noriyuki
;
Yoshizawa, Noriko
;
Suemasu, Takashi
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
2012, 51 (09)

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Nakamura, Kotaro
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Du, Weijie
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Khan, M. Ajmal
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Koike, Shintaro
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Usami, Noritaka
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Saito, Noriyuki
论文数: 0 引用数: 0
h-index: 0
机构:
AIST, IBEC Innovat Platform, Electron Microscope Facil, Tsukuba, Ibaraki 3058569, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Yoshizawa, Noriko
论文数: 0 引用数: 0
h-index: 0
机构:
AIST, IBEC Innovat Platform, Electron Microscope Facil, Tsukuba, Ibaraki 3058569, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[5]
Investigation of grain boundaries in BaSi2 epitaxial films on Si(111) substrates using transmission electron microscopy and electron-beam-induced current technique
[J].
Baba, Masakazu
;
Toh, Katsuaki
;
Toko, Kaoru
;
Saito, Noriyuki
;
Yoshizawa, Noriko
;
Jiptner, Karolin
;
Sekiguchi, Takashi
;
Hara, Kosuke O.
;
Usami, Noritaka
;
Suemasu, Takashi
.
JOURNAL OF CRYSTAL GROWTH,
2012, 348 (01)
:75-79

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toh, Katsuaki
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Saito, Noriyuki
论文数: 0 引用数: 0
h-index: 0
机构:
AIST, IBEC Innovat Platform, Electron Microscope Facil, Tsukuba, Ibaraki 3058569, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Yoshizawa, Noriko
论文数: 0 引用数: 0
h-index: 0
机构:
AIST, IBEC Innovat Platform, Electron Microscope Facil, Tsukuba, Ibaraki 3058569, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Jiptner, Karolin
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Sekiguchi, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Hara, Kosuke O.
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Usami, Noritaka
论文数: 0 引用数: 0
h-index: 0
机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[6]
The effect of front ZnO:Al surface texture and optical transparency on efficient light trapping in silicon thin-film solar cells
[J].
Berginski, Michael
;
Huepkes, Juergen
;
Schulte, Melanie
;
Schoepe, Gunnar
;
Stiebig, Helmut
;
Rech, Bernd
;
Wuttig, Matthias
.
JOURNAL OF APPLIED PHYSICS,
2007, 101 (07)

Berginski, Michael
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Huepkes, Juergen
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Schulte, Melanie
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Schoepe, Gunnar
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Stiebig, Helmut
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Rech, Bernd
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany

Wuttig, Matthias
论文数: 0 引用数: 0
h-index: 0
机构: Forschungszentrum Julich, Inst Photovolta, D-52425 Julich, Germany
[7]
THIN-FILM CDS/CDTE SOLAR-CELL WITH 15.8-PERCENT EFFICIENCY
[J].
BRITT, J
;
FEREKIDES, C
.
APPLIED PHYSICS LETTERS,
1993, 62 (22)
:2851-2852

BRITT, J
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV S FLORIDA,DEPT ELECT ENGN,TAMPA,FL 33620 UNIV S FLORIDA,DEPT ELECT ENGN,TAMPA,FL 33620

FEREKIDES, C
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV S FLORIDA,DEPT ELECT ENGN,TAMPA,FL 33620 UNIV S FLORIDA,DEPT ELECT ENGN,TAMPA,FL 33620
[8]
LIGHT TRAPPING IN TEXTURED SOLAR-CELLS
[J].
CAMPBELL, P
.
SOLAR ENERGY MATERIALS,
1990, 21 (2-3)
:165-172

CAMPBELL, P
论文数: 0 引用数: 0
h-index: 0
[9]
Electron-beam-induced current study of grain boundaries in multicrystalline silicon
[J].
Chen, J
;
Sekiguchi, T
;
Yang, D
;
Yin, F
;
Kido, K
;
Tsurekawa, S
.
JOURNAL OF APPLIED PHYSICS,
2004, 96 (10)
:5490-5495

Chen, J
论文数: 0 引用数: 0
h-index: 0
机构: Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan

Sekiguchi, T
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan

Yang, D
论文数: 0 引用数: 0
h-index: 0
机构: Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan

Yin, F
论文数: 0 引用数: 0
h-index: 0
机构: Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan

Kido, K
论文数: 0 引用数: 0
h-index: 0
机构: Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan

Tsurekawa, S
论文数: 0 引用数: 0
h-index: 0
机构: Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan
[10]
Analysis of the electrical properties of Cr/n-BaSi2 Schottky junction and n-BaSi2/p-Si heterojunction diodes for solar cell applications
[J].
Du, Weijie
;
Baba, Masakazu
;
Toko, Kaoru
;
Hara, Kosuke O.
;
Watanabe, Kentaro
;
Sekiguchi, Takashi
;
Usami, Noritaka
;
Suemasu, Takashi
.
JOURNAL OF APPLIED PHYSICS,
2014, 115 (22)

Du, Weijie
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Baba, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Toko, Kaoru
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Hara, Kosuke O.
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Watanabe, Kentaro
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Sekiguchi, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Usami, Noritaka
论文数: 0 引用数: 0
h-index: 0
机构:
Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
Japan Sci & Technol Agcy, Core Res Evolut Sci & Technol, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

Suemasu, Takashi
论文数: 0 引用数: 0
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机构:
Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
Japan Sci & Technol Agcy, Core Res Evolut Sci & Technol, Chiyoda Ku, Tokyo 1020075, Japan Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan