Light Trapping Induced High Short-Circuit Current Density in III-Nitride Nanorods/Si (111) Heterojunction Solar Cells

被引:5
作者
Chang, Ching-Wen [1 ,2 ,3 ,4 ]
Wadekar, Paritosh, V [1 ,2 ]
Huang, Hui-Chun [5 ]
Chen, Quark Yung-Sung [1 ,2 ,6 ,7 ]
Wu, Yuh-Renn [8 ,9 ]
Chen, Ray T. [3 ]
Tu, Li-Wei [1 ,2 ,10 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Ctr Crystal Res, Kaohsiung 80424, Taiwan
[3] Univ Texas Austin, Dept Elect & Comp Engn, Austin, TX 78758 USA
[4] Acad Sinica, Res Ctr Appl Sci, Taipei 11529, Taiwan
[5] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 80424, Taiwan
[6] Univ Houston, Dept Phys, Houston, TX 77004 USA
[7] Univ Houston, Texas Ctr Superconduct, Houston, TX 77004 USA
[8] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[9] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
[10] Kaohsiung Med Univ, Dept Med Lab Sci & Biotechnol, Kaohsiung 80708, Taiwan
来源
NANOSCALE RESEARCH LETTERS | 2020年 / 15卷 / 01期
关键词
III-nitride; Nanorod; Light trapping; Solar cell; Photovoltaic device; Plasma-assisted molecular beam epitaxy; EMITTING-DIODES; MOVPE GROWTH; INGAN; GAN; EFFICIENCY; SIMULATION; INN; LAYER; TEMPERATURE; PERFORMANCE;
D O I
10.1186/s11671-020-03392-z
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An effective-area photovoltaic efficiency of 1.27% in power conversion, excluding the grid metal contact area and under 1 sun, AM 1.5G conditions, has been obtained for the p-GaN/i-InGaN/n-GaN diode arrays epitaxially grown on (111)-Si. The short-circuit current density is 14.96 mA/cm(2)and the open-circuit voltage is 0.28 V. Enhanced light trapping acquired via multiple reflections within the strain and defect free III-nitride nanorod array structures and the short-wavelength responses boosted by the wide bandgap III-nitride constituents are believed to contribute to the observed enhancements in device performance.
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页数:12
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