Atomic Resolution Phase Contrast Imaging and In-Line Holography Using Variable Voltage and Dose Rate

被引:30
作者
Barton, Bastian [2 ]
Jiang, Bin [3 ]
Song, ChengYu [1 ]
Specht, Petra [4 ]
Calderon, Hector [5 ]
Kisielowski, Christian [1 ,6 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
[3] FEI Co, Hillsboro, OR 97124 USA
[4] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[5] IPN, Escuela Super Fis & Matemat, Mexico City 07738, DF, Mexico
[6] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Joint Ctr Artificial Photosynth, Berkeley, CA 94720 USA
关键词
in-line electron holography; aberration-corrected TEM; high-resolution TEM; low voltage TEM; low dose TEM; monochromator; exit wave reconstruction; focal series; lattice phonons; TRANSMISSION ELECTRON-MICROSCOPY; RADIATION-DAMAGE; ABERRATION; SILICON; TEM;
D O I
10.1017/S1431927612001213
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The TEAM 0.5 electron microscope is employed to demonstrate atomic resolution phase contrast imaging and focal series reconstruction with acceleration voltages between 20 and 300 kV and a variable dose rate. A monochromator with an energy spread of <= 0.1 eV is used for dose variation by a factor of 1,000 and to provide a beam-limiting aperture. The sub-Angstrom performance of the instrument remains uncompromised. Using samples obtained from silicon wafers by chemical etching, the [200] atom dumbbell distance of 1.36 angstrom can be resolved in single images and reconstructed exit wave functions at 300, 80, and 50 kV. At 20 kV, atomic resolution < 2 angstrom is readily available but limited by residual lens aberrations at large scattering angles. Exit wave functions reconstructed from images recorded under low dose rate conditions show sharper atom peaks as compared to high dose rate. The observed dose rate dependence of the signal is explained by a reduction of beam-induced atom displacements. If a combined sample and instrument instability is considered, the experimental image contrast can be matched quantitatively to simulations. The described development allows for atomic resolution transmission electron microscopy of interfaces between soft and hard materials over a wide range of voltages and electron doses.
引用
收藏
页码:982 / 994
页数:13
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