Initiated Chemical Vapor Deposition-Based Method for Patterning Polymer and Metal Microstructures on Curved Substrates

被引：26
作者：
Petruczok, Christy D. [1 ]
Gleason, Karen K. [1 ]
机构：
[1] MIT, Dept Chem Engn, Cambridge, MA 02139 USA
来源：
ADVANCED MATERIALS | 2012年 / 24卷 / 48期
基金：
美国国家科学基金会;
关键词：
chemical vapor deposition; thin films; patterning; curved substrates; multifunctional surfaces; SURFACES; LITHOGRAPHY; FILMS; PHOTOLITHOGRAPHY; FABRICATION; COPOLYMERS; CRYSTALS;
D O I：
10.1002/adma.201201975
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.
引用
收藏
页码：6445 / 6450
页数：6
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