Mechanism of Self-Epitaxy in Buffer Layer for Coated Conductors

被引:7
作者
Taneda, Takahiro [1 ,2 ]
Yoshizumi, Masateru [1 ]
Takahashi, Takahiko [1 ]
Kuriki, Reiji [1 ]
Shinozaki, Takaomi [1 ]
Izumi, Teruo [1 ]
Shiohara, Yuh [1 ]
Iijima, Yasuhiro [3 ]
Saitoh, Takashi [3 ]
Yoshida, Ryuji [4 ]
Kato, Takeharu [4 ]
Hirayama, Tsukasa [4 ]
Kiss, Takanobu [2 ]
机构
[1] Int Superconduct Technol Ctr ISTEC, SRL, Koto Ku, Tokyo 1350062, Japan
[2] Kyushu Univ, Dept Elect Engn, Nishi Ku, Fukuoka 8190935, Japan
[3] Fujikura Ltd, Sakura, Chiba 2858550, Japan
[4] Japan Fine Ceram Ctr, Atsuta Ku, Nagoya, Aichi 4568587, Japan
关键词
CeO2 buffer layer; IBAD; in-plane misorientation angle; self-epitaxy; YBCO coated conductor; PULSED-LASER DEPOSITION; BEAM-ASSISTED DEPOSITION; RADIATION-DAMAGE; TEXTURE DEVELOPMENT; SINGLE-CRYSTALS; THIN-FILMS; MGO; YSZ;
D O I
10.1109/TASC.2012.2235113
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To elucidate the self-epitaxy mechanism of pulsed-laser deposition-CeO2, a hypothetical relationship with the substrate was derived based on the ion-beam-assisted deposition layer-processing method: the smaller the misorientation angle, the larger the crystallite size. In-plane misorientation angle dependences of crystallite sizes of ion-beam-assisted deposition-MgO and LaMnO3 as substrates for CeO2 deposition, obtained using X-ray diffraction and transmission electron microscopy, indicated that the hypothesis is plausible. This relationship is regarded as a prerequisite for self-epitaxy because large crystallites with small strains would be energetically favorable when CeO2 particles crystallize on them. Eventually, they will grow to dominant grains, which is a possible self-epitaxy mechanism.
引用
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页数:5
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