Use of multiwavelength emission from hollow cathode lamp for measurement of state resolved atom density of metal vapor produced by electron beam evaporation

被引:4
作者
Majumder, A. [1 ]
Dikshit, B. [1 ]
Bhatia, M. S. [1 ]
Mago, V. K. [1 ]
机构
[1] Bhabha Atom Res Ctr, Div Laser & Plasma Technol, Bombay 400085, Maharashtra, India
关键词
D O I
10.1063/1.2987689
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
State resolved atom population of metal vapor having low-lying metastable states departs from equilibrium value. It needs to be experimentally investigated. This paper reports the use of hollow cathode lamp based atomic absorption spectroscopy technique to measure online the state resolved atom density (ground and metastable) of metal vapor in an atomic beam produced by a high power electron gun. In particular, the advantage of availability of multiwavelength emission in hollow cathode lamp is used to determine the atom density in different states. Here, several transitions pertaining to a given state have also been invoked to obtain the mean value of atom density thereby providing an opportunity for in situ averaging. It is observed that at higher source temperatures the atoms from metastable state relax to the ground state. This is ascribed to competing processes of atom-atom and electron-atom collisions. The formation of collision induced virtual source is inferred from measurement of atom density distribution profile along the width of the atomic beam. The total line-of-sight average atom density measured by absorption technique using hollow cathode lamp is compared to that measured by atomic vapor deposition method. The presence of collisions is further supported by determination of beaming exponent by numerically fitting the data. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.2987689]
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页数:7
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共 42 条
  • [1] [Anonymous], 1982, Electron beam technology
  • [2] ASANO T, 1992, J NUCL SCI TECHNOL, V29, P1194, DOI 10.3327/jnst.29.1194
  • [3] Bauman R.P., 1962, ABSORPTION SPECTROSC
  • [4] Study of the expansion of a plasma generated by electron-beam evaporation
    Besuelle, E
    Nicolai, JP
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (08) : 4114 - 4121
  • [5] NOVEL IN-SITU METHOD FOR LOCATING VIRTUAL SOURCE IN HIGH-RATE ELECTRON-BEAM EVAPORATION
    BHATIA, MS
    [J]. APPLIED PHYSICS LETTERS, 1994, 65 (02) : 251 - 253
  • [6] SIMPLE NONCONTACT TEMPERATURE SENSOR FOR DIAGNOSTIC USE IN ELECTRON-BEAM EVAPORATORS
    BHATIA, MS
    CHATTERJEE, UK
    SHARMA, GL
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (08) : 2371 - 2372
  • [7] REAL-TIME CONTROL OF MOLECULAR-BEAM EPITAXY BY OPTICAL-BASED FLUX MONITORING
    CHALMERS, SA
    KILLEEN, KP
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (23) : 3131 - 3133
  • [8] RELAXATION OF NEODYMIUM IN A WEAKLY IONIZED EXPANDING PLASMA
    CHEN, HL
    BEDFORD, R
    BORZILERI, C
    BRUNNER, W
    HAYES, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) : 6136 - 6141
  • [9] GROUP-DELAY DIAGNOSTIC FOR MEASURING VAPOR COLUMN DENSITY
    CRANE, JK
    PRESTA, RW
    CHRISTENSEN, JJ
    COOKE, JD
    SHAW, MJ
    JOHNSON, MA
    PAISNER, JA
    [J]. APPLIED OPTICS, 1991, 30 (30): : 4289 - 4296
  • [10] THERMODYNAMICS OF LIQUID URANIUM VAPORIZATION
    DAS, D
    DHARWADKAR, SR
    CHANDRASEKHARAIAH, MS
    [J]. JOURNAL OF NUCLEAR MATERIALS, 1985, 130 (FEB) : 217 - 224