Deep levels in silicon carbide Schottky diodes

被引:38
作者
Castaldini, A
Cavallini, A
Polenta, L
Nava, F
Canali, C
Lanzieri, C
机构
[1] Univ Bologna, INFM, I-40127 Bologna, Italy
[2] Univ Bologna, Dipartimento Fis, I-40127 Bologna, Italy
[3] INFM, Modena, Italy
[4] Univ Modena, Dipartimento Fis, I-41100 Modena, Italy
[5] Dipartimento Sci Ingn, Modena, Italy
[6] ALENIA MARCONI Syst, Rome, Italy
关键词
silicon carbide; deep levels; DLTS; ICTS; capture cross-section;
D O I
10.1016/S0169-4332(01)00993-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Native or process-induced defective states may significantly affect the transport properties of silicon carbide devices. For this reason, it is of major importance to detect them and, when possible, to identify their origin. This contribution deals with the deep levels detected by deep level transient spectroscopy analyses in silicon carbide Schottky detectors. Current-voltage and capacitance-voltage characteristics have also been studied to investigate Schottky barrier properties and diode quality. On the basis of the comparison with literature data, some of the deep levels found can be attributed to impurities introduced during growth. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:248 / 252
页数:5
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