Effect of intrinsic stress on the optical properties of nanostructured ZnO thin films grown by rf magnetron sputtering

被引：130

作者：

Kumar, Rajesh ^{[1
,2
]}

Khare, Neeraj ^{[3
]}

Kumar, Vijay ^{[1
]}

Bhalla, G. L. ^{[2
]}

机构：

[1] Natl Phys Lab, New Delhi 110012, India

[2] Univ Delhi, Dept Phys & Astrophys, Delhi 110007, India

[3] Indian Inst Technol, Dept Phys, New Delhi 110016, India

来源：

APPLIED SURFACE SCIENCE | 2008年 / 254卷 / 20期

关键词：

stress; optical properties; ZnO;

D O I：

10.1016/j.apsusc.2008.04.012

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this paper we report the effect of deposition temperature on the structural and optical properties of ZnO thin films prepared by rf magnetron sputtering. The films grown at lower deposition temperatures were in a state of large compressive stress, whereas the films grown at higher temperature (450 degrees C) were almost stress free. In the absorption spectra, the ZnO excitonic and the Zn surface plasmon resonance (SPR) peaks have been observed. A redshift in the optical band gap of ZnO films has also been observed with the increase in the deposition temperature. The shift in the band gap calculated from the size effect did not match with the observed shift values and the observed shift has been attributed to the compressive stress present in the films. (C) 2008 Published by Elsevier B. V.

引用

页码：6509 / 6513

页数：5

共 50 条

[31] Optical properties of thin films cadmium chalcogenide obtained by the RF magnetron sputtering
Maistruk, E., V
Koziarskyi, I. P.
Koziarskyi, D. P.
Andrushchak, G. O.
THIRTEENTH INTERNATIONAL CONFERENCE ON CORRELATION OPTICS, 2017, 10612
[32] Ga DOPED ZnO THIN FILMS DEPOSITED BY RF MAGNETRON SPUTTERING - PREPARATION AND PROPERTIES
Irimia, M.
Rambu, A. P.
Zodieru, G.
Leonte, I. I.
Purica, M.
Iacomi, F.
2011 INTERNATIONAL SEMICONDUCTOR CONFERENCE (CAS 2011), 34TH EDITION, VOLS 1 AND 2, 2011, : 287 - 290
[33] Effect of rf power on Structural, Optical and Morphological Properties of Ultrathin Undoped ZnO films deposited by rf Magnetron Sputtering
Kumar, J. Vinoth
Maldonado, A.
Matsumoto, Y.
Olvera, M. de la L.
2014 11TH INTERNATIONAL CONFERENCE ON ELECTRICAL ENGINEERING, COMPUTING SCIENCE AND AUTOMATIC CONTROL (CCE), 2014,
[34] Properties of Al heavy-doped ZnO thin films by RF magnetron sputtering
Li, L. J.
Deng, H.
Dai, L. P.
Chen, J. J.
Yuan, Q. L.
Li, Y.
MATERIALS RESEARCH BULLETIN, 2008, 43 (06) : 1456 - 1462
[35] Structural and optical properties of ZnO thin films on (111) CaF2 substrates grown by magnetron sputtering
Wang, Yinzhen
Chu, Benli
SUPERLATTICES AND MICROSTRUCTURES, 2008, 44 (01) : 54 - 61
[36] Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering
Nair, Prabitha B.
Justinvictor, V. B.
Daniel, Georgi P.
Joy, K.
Ramakrishnan, V.
Thomas, P. V.
APPLIED SURFACE SCIENCE, 2011, 257 (24) : 10869 - 10875
[37] Structural and optical characterization of Cu doped ZnO thin films deposited by RF magnetron sputtering
Toma, Maria
Ursulean, Nicolae
Marconi, Daniel
Pop, Aurel
JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2019, 70 (07): : 127 - 131
[38] Annealing effects on structural and optical properties of ZnMgO films grown by RF magnetron sputtering
Zhao, R. R.
Wei, X. Q.
Wang, Y. J.
Xu, X. J.
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2013, 24 (11) : 4290 - 4295
[39] Effect of annealing treatment on structural, electrical, and optical properties of Ga-doped ZnO thin films deposited by RF magnetron sputtering
Wu, F.
Fang, L.
Pan, Y. J.
Zhou, K.
Ruan, H. B.
Liu, G. B.
Kong, C. Y.
THIN SOLID FILMS, 2011, 520 (02) : 703 - 707
[40] Effect of Mn doping on the nanostructure and optical properties of ZnO films synthesized by magnetron sputtering
Wu, Z. F.
Wu, X. M.
Zhuge, L. J.
Hong, B.
Yang, X. M.
Yu, T.
He, J. J.
Chen, Q.
APPLIED SURFACE SCIENCE, 2010, 256 (07) : 2259 - 2262

← 1 2 3 4 5 →