Electroless Deposition of Copper on Organic and Inorganic Substrates Using a Sn/Ag Catalyst

被引:30
作者
Fritz, Nathan [1 ]
Koo, Hyo-Chol [1 ]
Wilson, Zachary [1 ]
Uzunlar, Erdal [1 ]
Wen, Zhongsheng [1 ]
Yeow, Xinyi [1 ]
Allen, Sue Ann Bidstrup [1 ]
Kohl, Paul A. [1 ]
机构
[1] Georgia Inst Technol, Sch Chem & Biomol Engn, Atlanta, GA 30332 USA
关键词
WET CHEMICAL TREATMENTS; EPOXY POLYMER LAYERS; SURFACE-ROUGHNESS; BUILDUP LAYERS; NANOPARTICLES; PRETREATMENT; ACTIVATION; POLYIMIDE; CU;
D O I
10.1149/2.099206jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this study, the electroless deposition of copper and silver was investigated on epoxy and silicon dioxide-based substrates. A cost-efficient, Sn/Ag catalyst was investigated as a replacement for the Sn/Pd catalyst currently used in board technology. The surface of the epoxy based polyhedral oligomeric silsesquioxane (POSS) films was modified by plasma and chemical etching for electroless activation without the creation of a roughened surface. The electroless copper deposited on the modified POSS surface exhibited excellent adhesion when annealed at 180 degrees C in nitrogen for 90 min or at room temperature for 24 hr. Electroless copper deposition was also demonstrated on oxidized silicon wafers for through silicon via sidewall deposition.
引用
收藏
页码:D386 / D392
页数:7
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