Deposition of yttria-stabilised zirconia coatings using liquid precursors

被引：0

作者：

Bouyer, E ^{[1
]}

Branston, DW ^{[1
]}

Lins, G ^{[1
]}

Müller, M ^{[1
]}

Verleger, J ^{[1
]}

von Bradke, N ^{[1
]}

机构：

[1] Siemens Corp Technol, D-91050 Erlangen, Germany

来源：

PROGRESS IN PLASMA PROCESSING OF MATERIALS 2001 | 2001年

关键词：

induction plasma; thermal-plasma CVD; liquid precursors; yttria-stabilised zirconia; thermal barrier coatings;

D O I：

暂无

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

Aqueous solutions containing ZrO(NO3)(2). 6H(2)O were injected into an inductively generated high-power plasma to produce zirconia coatings in a thermal plasma chemical vapour deposition (TPCVD) process. Coatings of monoclinic ZrO2 which adhered well to the substrate were obtained when ZrO(NO3)(2). 6H(2)O alone was present in the solvent with a concentration of 0.7 mol/l. When Y(NO3)(3). 6H(2)O was added such that the concentration ratio of Zr and Y salts was 6:1, the ZrO2 forming the coatings was stabilised in its cubic modification which was confirmed by X-ray diffractometry as well as EDX mapping.

引用

页码：501 / 506

页数：6

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