Structural and Optical Properties of TiO2 Thin Films Prepared by Thermal Oxidation of Ti Thin Films

被引：0
|
作者：
Uttayan, L. [1 ]
Aiempanakit, K. [1 ]
Horprathum, M. [2 ]
Eiamchai, P. [2 ]
Pattantsetakul, V. [2 ]
Nuntawong, N. [2 ]
Chindaudom, P. [2 ]
机构：
[1] Thammasat Univ, Fac Sci & Technol, Dept Phys, Pathum Thani 12121, Thailand
[2] Natl Elect & Comp Technol Ctr, Opt Thin Film Lab, Pathum Thani 12120, Thailand
来源：
APPLIED PHYSICS AND MATERIAL APPLICATIONS | 2013年 / 770卷
关键词：
Titanium dioxide; Thermal oxidation; Optical properties; GAS-SENSING PROPERTIES;
D O I：
10.4028/www.scientific.net/AMR.770.225
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Titanium dioxide (TiO2) films were prepared by thermal oxidation from Ti films. The Ti films were deposited on glass and silicon (100) wafer substrate by dc magnetron sputtering and subsequent with thermal oxidation process. The crystal structure and morphology of TiO2 films were estimated by using X-ray diffractometry (XRD) and field-emission scanning electron microscopy (FE-SEM), respectively. The optical property of TiO2 films was determined by UV-Visible spectrophotometer. The influences of annealing temperature between 200 to 500 degrees C in air for 1 hour on the structure and optical properties of TiO2 films were investigated. The increasing of annealing temperature was directly affected the phase transition from Ti to TiO2. The optical and structural properties of TiO2 films are the best exhibited with increasing the annealing temperature at 500 degrees C.
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页码：225 / +
页数：2
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