Epitaxial growth of (Pb, La)TiO3 thin films on (0001) Al2O3 and (001)SrTiO3 substrates by RF magnetron sputtering

被引:0
作者
Rabibisoa, U [1 ]
Aubert, P [1 ]
Bridou, F [1 ]
Hugon, MC [1 ]
Agius, B [1 ]
机构
[1] Lab Charles Fabry, Grp Phys Films Mince, F-91403 Orsay, France
关键词
PLT; thin films; microstructure; epitaxy; RF magnetron sputtering;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ferroelectric lead lathanum titanate (PLT) thin films were grown by rf magnetron sputtering on (0001) Al2O3 and (001) SrTiO3 substrates, from a ceramic Pb0.9La0.1TiO3 target, in a reactive Ar/O-2 atmosphere. The surface morphology was examined by atomic force microscopy (AFM); rms roughness of 2 to 4 nm was achieved on these films. Thin film interfaces were characterized by grazing X-ray reflectometry : they were found to be relatively smooth, and no interdiffusion layer was found between the film and the substrate. The structural properties of the films were investigated by X-ray diffraction (XRD). Perovskite single phase has been achieved with a temperature of 650 degrees C. Pole figures and asymmetric scans show the epitaxial nature of the films.
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页码:1109 / 1116
页数:8
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